A non-destructive tomographic depth profiling framework for highprecision interface analysisOA
Non-destructive,depth-resolved characterization is crucial for revealing the evolution of interfacial electronic structures in energy materials and catalytic systems.To overcome the limitations of conventional approaches,which often damage samples and fail to capture true interfacial information,we have established a synchrotron-based platform for non-destructive tomography depth profiling(NDTDP)at the BL10B beamline of Hefei Light Source II.This platform integrates energy-and angle-tunable synchrotron radiation photoelectron spectroscopy with multi-mode soft Xray absorption spectroscopy,enabling continuous depth profiling from the outermost surface to near-bulk regions.Using single-crystal Si and Cu_(2)O powders as model systems,we systematically validated the platform’s ability to resolve surface oxidation and valence-state gradients,demonstrating high depth resolution and consistency across measurements.These findings establish BL10B as a reliable,NDTDP platform for probing complex interfacial electronic structures and conducting in situ studies.
Zhentao Ma;Limin Liu;Xiaokang Liu;Yide Zhu;Zixiang Huang;Mengke Zhang;Zirui Xu;Wenhao Song;Lihui Wu;Haibin Pan;Xusheng Zheng
National Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,China Hefei National Research Center for Physical Sciences at the Microscale,University of Science and Technology of China,Hefei 230026,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,ChinaNational Synchrotron Radiation Laboratory(NSRL),University of Science and Technology of China,Hefei 230029,China
数理科学
BL10B endstationnon-destructivedepth-resolved characterizationinterfacial electronic structures
《Nano Research》 2026 (6)
P.604-612,9
supported by the National Natural Science Foundation of China(Nos.12222508,12475325,and 12205304)the National Key Research and Development Program of China(Nos.2024YFA1509201 and 2023YFA1506304)Anhui Provincial Natural Science Fundation(No.2308085MA19)the Fundamental Research Funds for the Central Universities(No.WK2060250114)。
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