高深径比微孔槽标准样板及其应用研究OA

With the development of non-destructive testing technologies such as optical interference and spectral inversion,the demand for standardized measurement of high-aspect-ratio microstructures has become increasingly urgent.In order to achieve precise calibration of non-destructive measurement systems for high-aspect-ratio structures,a standard template of micro-hole with a depth-to-diameter ratio up to 20∶1 was developed.By optimizing the deep silicon etching process,the precise preparation of micro-hole with a high-aspect-ratio was achieved,ensuring the uniformity of the micro-hole structure.By adopting the three-level precise control section preparation and combining the geometric compensation characterization method,the high-quality preparation of the structural characterization section with a high-aspect-ratio was completed,and the precise measurement and calibration analysis of the diameter and depth dimensions of the standard template were achieved.Based on the calibration results from on-chip integrated slice holes and uniformity evaluation of the standard template,parameter assignment and calibration applications for standard holes were realized.The standard template has been applied to calibrate the near-infrared broad-spectrum interference microscopy measurement system,providing a physical reference standard for on-site calibration of non-destructive measurement instruments for high-aspect-ratio micro-hole in the semiconductor field.