通过局部环境优化实现铜纳米团簇高效二氧化碳电还原制甲烷OA
Efficient Electrochemical Reduction of CO2 to Methane by Local Environment Optimization of Copper Nanoclusters
在电催化二氧化碳还原反应(CO2RR)中,调控催化剂层结构是优化局部CO2浓度、提升催化性能的有效策略.本研究合成了原子级精确的Cu4纳米团簇([Cu4(PPh3)4(4-EBA)3]PF6),其铜核为四面体结构,并考察了催化层构筑工艺对CO₂RR性能的影响.通过优化滴涂法、手绘法和喷涂法,发现滴涂法制备的催化剂层薄而致密,双电层电容(Cdl=0.951 mF/cm²)最大,表明其电化学活性面积较高,有利于高电流密度下的CH₄生成.在优化进料浓度及流速后,该体系在400 mA/cm²的电流密度下实现了61%的CH₄法拉第效率.滴涂法构筑的催化剂电极表现出的高活性可能源自2个因素:较薄的催化剂层缩短了电子与质子的传输路径;致密的催化剂层表现出较高的疏水性,有效抑制析氢反应.本研究为高效铜纳米团簇催化剂设计及催化层优化提供了新策略.
In electrocatalytic CO2 reduction reaction(CO2 RR),modulating the catalyst layer structure is an effective strategy for optimizing the local CO2 concentration and enhancing catalytic performance.This study synthesized an atomically precise Cu4 nanocluster([Cu4(PPh3)4(4-EBA)3]PF6)featuring a tetrahedral copper core and investigated the influence of catalyst layer fabrication methods on CO2 RR performance.By optimizing the drop-casting,hand-painting,and spray-coating techniques,it was found that the catalyst layer prepared by drop-casting was thin and dense,exhibiting the largest double-layer capacitance(Cdl=0.951 mF/cm2),which indicates a higher electrochemical active area conducive to CH4 generation at high current densities.After optimizing the feed concentration and flow rate,the system achieved a Faradaic efficiency of 61%for CH4 at a current density of 400 mA/cm2.The high activity of the drop-cast catalyst electrode may be attributed to two factors:the thin catalyst layer shortens the transport pathways for electrons and protons,while the dense structure confers high hydrophobicity,effectively suppressing the hydrogen evolution reaction.This work provides new insights into the design of efficient copper nanocluster catalysts and the optimization of catalyst layers.
李宁静;诸颖;李江;陈静
中国科学院上海应用物理研究所,上海 201800||中国科学院大学,北京 100049上海大学理学院材料生物学研究所,上海 201800上海大学理学院材料生物学研究所,上海 201800上海大学理学院材料生物学研究所,上海 201800
化学化工
电还原铜纳米团簇甲烷CO2
Electrochemical reductionCopper nanoclustersCH4CO2
《应用化学》 2026 (8)
1229-1237,中插1-中插6,15
国家重点研发计划(No.2023YFC3404200)资助 Supported by the National Key Research and Development Program(No.2023YFC3404200)
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