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IMS架构IGBT单管热优化及来料公差控制OA

Thermal Optimization and Material Tolerance Control of IMS Architecture IGBT Discrete

中文摘要英文摘要

IMS架构IGBT单管因其相比于DBC架构单管的独特优势,展现出巨大的应用潜力.然而,相对较高的结壳热阻成为阻碍其大规模应用的关键瓶颈,对其热特性的优化提升迫在眉睫.采用Flotherm计算流体动力学仿真软件进行建模仿真,结合正交试验与极差分析、方差分析,对IMS架构单管进行热阻优化.通过对焊料层厚度、走线铜层厚度、绝缘层厚度和基板厚度的精心调控,结壳热阻从优化前的6.105 K/W 降至4.645 K/W,下降约25%,优化后的器件在不同耗散功率下的结温均低于原始器件.并通过F值的计算、比较,确定各因素中走线铜层厚度与焊料层厚度对热阻的影响显著,需要对单管的绝缘层以及走线铜层的来料公差严格控制.

Compared with IGBT discretes with DBC architecture,IGBT discretes with IMS architecture possess unique advantages and show great application potential.Nevertheless,the relatively high junction-to-case thermal resistance acts as a critical bottleneck limiting their large-scale engineering applications,so it is urgent to optimize and improve their thermal performance.The Flotherm computational fluid dynamics simulation software is adopted for modeling and simulation.Combined with orthogonal test,range analysis and variance analysis,the thermal resistance of IMS-architecture IGBT discretes is optimized.By precisely adjusting the thicknesses of the solder layer,trace copper layer,insulating layer and substrate,the junction-to-case thermal resistance is reduced from 6.105 K/W to 4.645 K/W,with a reduction of approximately 25%.The junction thermal resistances of the optimized device under different power dissipation conditions are all lower than those of the original device.Through the calculation and comparison of F-values,the trace copper layer thickness and solder layer thickness are confirmed to be the dominant factors affecting thermal resistance.Accordingly,the incoming material tolerances of the insulating layer and trace copper layer of the devices need to be strictly controlled.

郑杰;黄钊渝;周亚州;刘利书;苏宇泉

兰州大学 物理科学与技术学院,兰州 730000||美垦半导体技术有限公司,重庆 401336美垦半导体技术有限公司,重庆 401336美垦半导体技术有限公司,重庆 401336美垦半导体技术有限公司,重庆 401336美垦半导体技术有限公司,重庆 401336

信息技术与安全科学

IGBT单管IMS架构热阻正交试验来料公差控制

IGBT discreteIMS architecturethermal resistanceorthogonal experimentincoming material tolerance control

《机电工程技术》 2026 (15)

7-12,6

10.3969/j.issn.1009-9492.2025.00129

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