基于动网格法的微波等离子体多物理场耦合计算模型OA

Micro wave plasma chemical vapor deposition(MPCVD)is a key technology for preparing high-quality single crystal diamond.The height of the substrate support in the reactor is an important parameter affecting the plasma distribution and material growth quality,and the movement of the substrate holder has a significant dy-namic impact on plasma morphology and material distribution.However,traditional static simulation methods can-not accurately describe the dynamic evolution process of plasma during the continuous movement of the support platform,and generally ignore the bidirectional coupling effect between plasma and electromagnetic field during the movement of the support platform.To accurately capture the dynamic process,the dynamic grid technique of arbi-trary Lagrangian Euler method is introduced into MPCVD multi physics field simulation for the first time,and the grid partitioning method and phased solving method are adopted to achieve multi physics field coupled dynamic simulation.The comparison between simulation results and experimental data shows that the model can accurately predict the evolution process of plasma at different platform heights,and the simulated number density of hydrogen atoms in the plasma center is consistent with the trend of Hα spectral line intensity in optical emission spectra.The study provides a reliable simulation tool for the dynamic optimization of the pedestal height in MPCVD process,which has important guiding significance for achieving controllable preparation of large-sized single crystal diamonds.