入射角偏差对消光椭偏法膜厚测量影响的研究OA
Effects of Incident Angle Deviation on Film Thickness Measurement Using Extinction Ellipsometry
使用消光椭偏法测量膜厚时,入射角作为改变入射光波和反射光波偏振态的重要过程参量,角度量值的准确性极大地影响了膜厚测量值的准确性.采用波长为632.8 nm的氦氖激光,建立了在不同入射角情况下,入射角偏差与测量膜厚偏差之间的数学模型,并且通过搭建消光椭偏装置对硅上二氧化硅样品进行了验证.对于被测样品102.55 nm的膜厚值而言,理论上计算可得入射角每变化0.01°,会对膜厚测量值最大引入0.008 7 nm的误差;装置测量结果表明,入射角偏差对结果引入的实际误差符合模型预期,进一步验证了消光椭偏装置的可靠性;优化了消光椭偏法中入射角偏差引入的不确定度分量的分析方法,装置入射角引入的不确定度分量为0.004 nm.
In the measurement of film thickness by extinction ellipsometry,the angle of incidence,as an important process parameter that changes the polarization states of incident and reflected light waves,significantly affects the accuracy of film thickness measurements.A He-Ne laser with a wavelength of 632.8 nm is used to establish a mathematical model between incident angle deviation and measured film thickness deviation under different incident angles.The model is verified by constructing an extinction ellipsometry setup and testing a silica-on-silicon sample.For the measured sample with a film thickness of 102.55 nm,theoretical calculations show that every 0.01° variation in the incident angle introduces a maximum error of 0.008 7 nm to the measured film thickness.Measurement results demonstrate that the actual error caused by incident angle deviation is consistent with model expectations,which further validates the reliability of the extinction ellipsometry setup.The analysis method for the uncertainty component introduced by incident angle deviation in extinction ellipsometry is optimized.The uncertainty component introduced by the incident angle of the setup is 0.004 nm.
杜陈伙;张树;胡佳成;皮磊;施玉书
中国计量大学,浙江 杭州 310018||中国计量科学研究院,北京 100029中国计量科学研究院,北京 100029||深圳中国计量科学研究院 技术创新研究院,广东 深圳 518107中国计量大学,浙江 杭州 310018中国计量科学研究院,北京 100029中国计量科学研究院,北京 100029||深圳中国计量科学研究院 技术创新研究院,广东 深圳 518107
通用工业技术
纳米计量薄膜厚度消光椭偏法误差分析入射角偏差
nanometrologyextinction ellipsometryfilm thicknesserror analysisincident angle deviation
《计量学报》 2026 (4)
475-481,7
国家重点研发计划(2022YFF0605501)
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