基于双离子束溅射沉积工艺优化的极紫外多层反射薄膜界面质量提升OA

In the fabrication of Mo-Si multilayers,achieving smooth and sharp interfaces is critical for real-izing high reflectivity in extreme ultraviolet(EUV)light,as atomic intermixing between adjacent Mo and Si layers along with microscopic interfacial fluctuations can significantly degrade EUV reflectivity.To ad-dress this challenge,we propose a process portfolio that combines angular deposition with flood ion beam etching to enhance interface quality.By utilizing stage modifications in dual ion beam sputtering,the inci-dent angle of the sputtered atom flux during deposition and the parameters of the auxiliary ion beam for pol-ishing can be precisely controlled to suppress intermixing and interfacial fluctuations.Experimental results show that the thickness of the intermixing layer is reduced to 0.6 nm,and interfacial roughness is sup-pressed to 0.2 nm using this approach.This method fundamentally improves the interfacial quality of Mo-Si multilayers and offers a practical solution for the fabrication of high-reflectance EUV optics.