1-MHz linewidth VCSEL enabled by monolithically integrated passive cavity for high-stability chip-scale atomic clocksOA
1-MHz linewidth VCSEL enabled by monolithically integrated passive cavity for high-stability chip-scale atomic clocks
Zhiting Tang;Hao Wang;Xiaorong Luo;Hongxing Xu;Jiang Wu;Chuanlin Li;Xuhao Zhang;Wuyang Ren;Kai Shen;Chuang Li;Qingsong Bai;Jin Li;Aobo Ren
Institute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China,Chengdu 611731,ChinaDivision of Electrical Engineering,Department of Engineering,University of Cambridge,Cambridge CB3 0FA,UKCollege of Microelectronics,Chengdu University of Information Technology,Chengdu,China||State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 611731,ChinaMozi Laboratory,Zhengzhou 450001,ChinaInstitute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China,Chengdu 611731,China||State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 611731,China||Mozi Laboratory,Zhengzhou 450001,ChinaInstitute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China,Chengdu 611731,ChinaInstitute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China,Chengdu 611731,ChinaInstitute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China,Chengdu 611731,ChinaInstitute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China,Chengdu 611731,ChinaInstitute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China,Chengdu 611731,ChinaChengdu Spaceon Electronics Corporation Ltd.,Chengdu 610036,ChinaSchool of Instrumentation and Optoelectronic Engineering,Beihang University,100191 Beijing,ChinaInstitute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China,Chengdu 611731,China
《光：科学与应用（英文版）》 2026 (4)
1105-1115,11
This work was supported by the National Key Research and Development Program of China(2021YFA1401100),Extreme Light Field Manufacturing Science and Engineering Research Center(52488301),National Natural Science Foundation of China(524721485220216552302164623040316257403662404035),and Natural Science Foundation of Sichuan Province(2025ZNSFSC0351).
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