Ultrathin van der Waals ferroelectric oxides for scalable low-power memoryOA
Ultrathin van der Waals ferroelectric oxides for scalable low-power memory
Xiaokun Qin;Bowen Zhong;Zheng Lou;Lili Wang
State Key Laboratory for Superlattices and Microstructures,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China||Center of Materials Science and Optoelectronic Engineering,University of Chinese Academy of Sciences,Beijing 100049,ChinaState Key Laboratory for Superlattices and Microstructures,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China||Center of Materials Science and Optoelectronic Engineering,University of Chinese Academy of Sciences,Beijing 100049,ChinaState Key Laboratory for Superlattices and Microstructures,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China||Center of Materials Science and Optoelectronic Engineering,University of Chinese Academy of Sciences,Beijing 100049,ChinaState Key Laboratory for Superlattices and Microstructures,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China||Center of Materials Science and Optoelectronic Engineering,University of Chinese Academy of Sciences,Beijing 100049,China
《半导体学报（英文版）》 2026 (4)
9-12,4
The authors sincerely acknowledge financial support from the Beijing Natural Science Foundation-Xiaomi Innova-tion Joint Fund(L233009).
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