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掺铕氧化铟薄膜的制备与发光特性OA北大核心CSTPCD

Preparation and photoelectric properties of indium oxide films with mixed europium

中文摘要英文摘要

采用射频磁控溅射的方法在石英衬底上制备了铕掺杂氧化铟(In2O3:Eu)薄膜.利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)和紫外-可见分光光度计对In2O3:Eu薄膜的晶体结构、表面形貌和光学带隙进行表征,并在室温下测量了In2O3:Eu薄膜的光致发光(PL)谱.结果表明:纯氧气氛和退火提升了In2O3:Eu薄膜的结晶质量;退火后In2O3:Eu薄膜的透过率和光学带隙增加;In2O3:Eu薄膜的发光主要为缺陷能级的宽带发射和Eu3+的5D0→7F3的复合发光;退火后,Eu3+发光峰相对强度增加.

Europium-doped indium oxide(In2O3:Eu)thin films are prepared on quartz substrates by RF magne-tron sputtering.The crystal structure,surface morphology and optical band gap of In2O3:Eu thin films are charac-terized by X-ray diffractometer(XRD),scanning electron microscope(SEM)and ultraviolet-visible spectropho-tometer.The photoluminescence(PL)spectra of In2O3:Eu thin films are measured at room temperature.The re-sults show that pure oxygen atmosphere and annealing improve the crystal quality of In2O3:Eu thin films.The transmittance and optical band gap of In2O3:Eu films increase after annealing.The luminescence of In2O3:Eu thin film is mainly the broadband emission of the defect level and the composite luminescence of 5D →7F3 of Eu3+.After annealing,the relative intensity of Eu3+luminescence peak increases.

周鸥翔;孙辉;韩梦瑶;沈龙海

沈阳理工大学理学院,沈阳 110159沈阳理工大学理学院,沈阳 110159沈阳理工大学理学院,沈阳 110159沈阳理工大学理学院,沈阳 110159

数理科学

氧化铟铕掺杂光致发光

indium oxideeuropium dopingphotoluminescence

《桂林理工大学学报》 2025 (6)

916-921,6

国家自然科学基金项目(12274304)超硬材料国家重点实验室开放课题(202004)

10.3969/j.issn.1674-9057.2025.06.014

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