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Synergistic performance and yield improvement of embedded RRAM product through process optimization in 40 nm CMOS platformOA
Synergistic performance and yield improvement of embedded RRAM product through process optimization in 40 nm CMOS platform
Zhenchao Sui;Yanqing Wu;Zhichao Lv;Xing Zhang
School of Software and Microelectronics,Peking University,Beijing 102600,China||Semiconductor Manufacturing Beijing Corporation,Beijing 100176,ChinaSchool of Software and Microelectronics,Peking University,Beijing 102600,ChinaHefei Reliance Memory Ltd.,Hefei 230088,ChinaSchool of Software and Microelectronics,Peking University,Beijing 102600,China
embedded RRAM40 nm CMOSdisplay driver ICprocess uniformity optimizationyield improvement
embedded RRAM40 nm CMOSdisplay driver ICprocess uniformity optimizationyield improvement
《半导体学报（英文版）》 2026 (3)
65-71,7
The authors gratefully acknowledge the technical sup-port of RRAM integration and module team of SMBC to this work.
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