Optimization and defect control in photoresist etch back processes for advanced semiconductor technologiesOA
Optimization and defect control in photoresist etch back processes for advanced semiconductor technologies
Ting Lei;Zhehong Liu;Zhiwen Liu;Guangjie Xue;Chun Sun;Jun Zhou;Xiangshui Miao
College of Integrated Circuits,Huazhong University of Science and Technology,Wuhan 430000,China||Wuhan Xinxin Semiconductor Manufacturing Corporation,Wuhan 430000,ChinaWuhan Xinxin Semiconductor Manufacturing Corporation,Wuhan 430000,ChinaWuhan Xinxin Semiconductor Manufacturing Corporation,Wuhan 430000,ChinaWuhan Xinxin Semiconductor Manufacturing Corporation,Wuhan 430000,ChinaWuhan Xinxin Semiconductor Manufacturing Corporation,Wuhan 430000,ChinaWuhan Xinxin Semiconductor Manufacturing Corporation,Wuhan 430000,ChinaCollege of Integrated Circuits,Huazhong University of Science and Technology,Wuhan 430000,China
PREBdummy poly removehorn heightpattern loading effect
PREBdummy poly removehorn heightpattern loading effect
《半导体学报（英文版）》 2026 (3)
38-45,8
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