共溅射Ti-Ta合金涂层的耐腐蚀性能分析OA

Ti-Ta alloy coatings show potential for surface modification of orthopedic and dental implants.To enhance the corrosion resistance of these coatings,Ti-Ta alloy layers were deposited using reactive magnetron co-sputtering.With the substrate temperature maintained at 200℃and the sputtering power of the Ti target held constant,the influence of varying Ta target power(50,100,150,and 200 W)on the phase composition,microstructure,and electrochemical corrosion be-havior of the coatings was systematically investigated.Results indicate that as the Ta sputtering power increased,the Ta content in the coatings rose and grain growth occurred.At the Ta power of 100 W,micro-pitted structures began to appear on the coating surface,becoming more pro-nounced with further increases in power,which contributed to a continuous enhancement in hy-drophobicity.When the Ta power reached 150 W,the β-phase started to dominate.The increased presence of the β-phase,along with the formation of micro-pitted surface structures,endowed the Ti-Ta coating prepared at this power with optimal corrosion resistance:it exhibited the lowest self-corrosion current density,elevated self-corrosion potential,and reduced pitting pits.Howev-er,at a higher power of 200 W,micro-cracks emerged on the coating surface,substantially increas-ing the contact area with the corrosive medium and consequently degrading the corrosion resist-ance.Therefore,the Ti-Ta coating deposited at the Ta target power of 150 W demonstrates supe-rior hydrophobicity and corrosion resistance,offering effective protection for implant applications.