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C19400铜合金带材缺陷分析OA

Defect Analysis of C19400 Copper Alloy Strip

中文摘要英文摘要

C19400铜铁磷合金的表面缺陷会显著影响其导电率与力学性能,这已成为制约该材料在高端半导体封装及电子元器件中应用的关键因素.本研究系统分析了C19400铜带材中成分缺陷的成因与微观形貌.采用Miedema模型对Cu-Fe-P体系进行热力学计算,预测铜基体中元素的分布行为;结合电火花直读光谱仪ARL8860、扫描电镜JSM-IT510及能谱仪(C-Nano)等分析手段,对缺陷试样进行微观组织与成分表征.结果表明,C19400铜合金带材存在多种夹杂物缺陷及析出相.具体表现为氧化物呈不规则薄片状分布,碳化物以深色小颗粒形态在局部区域聚集,磷化物分布于坑洞内部,硬质点则以不规则颗粒形式嵌于坑洞中,而析出相沿轧制方向呈长条状有序排列.追溯缺陷来源发现,熔铸工序中引入的成分缺陷随工艺流程传递至带材阶段,后续的轧制与退火工艺进一步改变了夹杂物的尺寸与分布形态.本研究明确了缺陷的演化路径与微观特征,为优化C19400制备工艺、提升其在高端电子领域应用的可靠性提供了理论依据与实验支持.

Surface defects in C19400 copper-iron alloys significantly degrade both electrical conductivity and mechanical properties,posing a key limitation on their application in high-end semiconductor packaging and electronic components.In this paper,origins and microscopic morphology of compositional defects in C19400 copper strips were systematically investigated.Distribution behavior of elements in the copper matrix was first predicted using Miedema model for thermodynamic calculations of Cu-Fe-P system.Subsequently,the defective samples were characterized in terms of microstructure and composition through methods including spark discharge optical emission spectrometry,scanning electron microscopy,and energy-dispersive spectroscopy.Results revealed the presence of various inclusion defects and precipitation in C19400 copper strips.Specifically,oxide inclusions appeared as irregular flakes;carbides aggregated as dark fine particles in localized areas;phosphides were distributed inside pits;hard inclusions were embedded as irregular particles within the pits,and precipitates aligned in elongated forms along the rolling direction.Traceability analysis indicated that compositional defects introduced during the melting and casting stages remained through manufacturing process to strip stage.Subsequent rolling and annealing treatments further altered the size and distribution of these inclusions.This study clarified the evolution path and microstructural characteristics of these defects,providing a theoretical and experimental basis for optimizing processing of C19400 and enhancing reliability of this material in high-end electronic applications.

魏迎辉;梁晖洁;刘伟;柴胜利;吕俊栋;杨景召

铜基新材料山西省重点实验室,山西 运城 044000||山西北铜新材料科技有限公司,山西 运城 044000铜基新材料山西省重点实验室,山西 运城 044000||山西北铜新材料科技有限公司,山西 运城 044000铜基新材料山西省重点实验室,山西 运城 044000||山西北铜新材料科技有限公司,山西 运城 044000铜基新材料山西省重点实验室,山西 运城 044000||山西北铜新材料科技有限公司,山西 运城 044000铜基新材料山西省重点实验室,山西 运城 044000||山西北铜新材料科技有限公司,山西 运城 044000铜基新材料山西省重点实验室,山西 运城 044000||山西北铜新材料科技有限公司,山西 运城 044000

矿业与冶金

C19400铜合金带材成分缺陷微观组织夹杂物性能分析

C19400 copper stripcomposition defectmicrostructureinclusionperformance analysis

《铜业工程》 2026 (1)

19-29,11

运城市2024年科技计划项目(YCKJ-2024014)资助

10.3969/j.issn.1009-3842.2026.01.002

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