应力释放对InGaN/GaN量子阱有源区发光特性的影响机制OA
Mechanism of strain relaxation effects upon luminescence characteristics of InGaN/GaN quantum well active regions
制备了两个不同的绿光InGaN/GaN量子阱(QW)结构(具有和不具有应力释放层),研究了其电致发光(EL)的注入电流依赖性和光致发光(PL)的温度依赖性.EL测量结果显示,与不具有应力释放层的QW结构(S1)相比,具有应力释放层的QW结构(S2)有一个较强的EL强度、显著的能量红移和一个较小的效率下垂;而PL测量结果则显示了S2比S1有更少的非辐射中心、更大的活化能和更高的内量子效率.这些结果表明,应力释放层的导入不仅缓解了有源区的应力、增加了In原子的并入,还提高了其有源区的结构质量、增强了其局域效果,同时降低了其电子泄露.这一解释得到了高分辨率X射线衍射测量结果的证实,结果显示S2比S1有更低的位错密度和更好的结构/结晶质量.
Two different green-emitting InGaN/GaN quantum well(QW)structures,with and without a strain-relieving layer,were prepared,and their injection current-dependence of electroluminescence(EL)and temperature dependence of photoluminescence(PL)were investigated.The EL measurements indica-ted that,comparing with the QW structure without a strain-relieving layer(S1),the QW structure with a strain-relieving layer(S2)exhibits a stronger EL intensity,a significant energy redshift,and a smaller ef-ficiency droop.In contrast,the PL measurements indicated that S2 has fewer non-radiative centers,a lar-ger activation energy,and a higher internal quantum efficiency than S1.These results reflected the fact that the introduction of the strain-relieving layer not only relieves the stress in the active region and en-hances the incorporation of Indium atoms,but also improves the structural quality of the active region,strengthens the carrier localization effect,and suppresses electron leakage.Such explanation is consistent with the high-resolution X-ray diffraction measurements,which have shown that S2 has a less dislocation density and better structural/crystalline quality than S1.
郭一庸;武智波;徐昊一;李长富;高渊;冀子武
山东大学 集成电路学院,山东 济南 250100山东大学 集成电路学院,山东 济南 250100泰山学院 物理与电子工程学院,山东 泰安 271021泰山学院 物理与电子工程学院,山东 泰安 271021山东大学 集成电路学院,山东 济南 250100中国电子科技集团公司 第十三研究所,河北 石家庄 050051
通用工业技术
InGaN/GaN量子阱应力释放层电致发光光致发光效率下垂内量子效率
InGaN/GaN quantum wellstrain-relieving layerelectroluminescencephotoluminescenceefficiency droopinternal quantum efficiency
《聊城大学学报(自然科学版)》 2026 (2)
249-254,6
国家自然科学基金项目(52272157,51872167)资助
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