基于增材制造的碳化硅双面反射镜设计与可靠性验证OA
Design and reliability verification of SiC double-sided reflector based on additive manufacturing
为实现同轴四反光学系统中主镜和四镜所构成的Φ516 mm双面共体反射镜轻量化、高刚度的设计目标,提出一种在传统轻量化设计基础上,融合多参数优化与碳化硅增材制造技术的方法.基于工程经验建立反射镜初始模型,选择主要结构尺寸建立多参数优化模型,并基于多目标遗传算法进行结构参数优化,优化后的反射镜质量为6.8 kg,相对初始方案降低32.6%.最后,完成碳化硅双面反射镜3D打印及结构模态测试,所得一阶频率为1 964 Hz.对两个镜面光学加工后,开展了重力影响试验、真空高低温试验和振动试验.结果表明,试验前后反射镜面形精度最大变化为0.001λ(λ=632 nm).碳化硅双面反射镜结构设计和增材制造工艺具有良好的可靠性和稳定性.
To meet the requirements of high lightweighting and high stiffness for a Φ516 mm double-sided integral reflector-comprising the primary and quaternary mirrors in a coaxial four-mirror optical system-a method integrating multi-parameter optimization with silicon carbide(SiC)additive manufacturing is pro-posed based on conventional lightweight design principles.First,an initial reflector model was established from engineering experience,and key structural dimensions were selected to formulate a multi-parameter optimization framework.The parametric model was then optimized using a multi-objective genetic algo-rithm.The optimized reflector weighs 6.8 kg,achieving a 32.6%reduction relative to the initial design.After completion of 3D printing,a structural modal test was conducted,yielding a first-order natural fre-quency of 1 964 Hz.Following optical processing of both mirror surfaces,gravity impact,vacuum high-low temperature,and vibration tests were performed.The maximum change in surface figure accuracy be-fore and after these tests satisfied the specified requirements.These results confirm the reliability and sta-bility of the SiC double-sided reflector design and demonstrate the robustness of the SiC additive manufac-turing process for high-performance integral reflectors.
王成彬;孙胜利;孙小进;马孝浩;胡凯
中国科学院 上海技术物理研究所 红外探测全国重点实验室,上海 200083中国科学院 上海技术物理研究所 红外探测全国重点实验室,上海 200083中国科学院 上海技术物理研究所 红外探测全国重点实验室,上海 200083中国科学院 上海技术物理研究所 红外探测全国重点实验室,上海 200083中国科学院 上海技术物理研究所 红外探测全国重点实验室,上海 200083
机械制造
增材制造碳化硅双面反射镜轻量化可靠性验证
additive manufacturingSiCdouble-sided reflectorlight weightingreliability verification
《光学精密工程》 2026 (1)
26-34,9
国家重点研发计划资助项目(No.2021YFB3701500)
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