Evolution of diamond film growth modes under varied plasma conditions:insights from optical emission spectroscopyOA
Evolution of diamond film growth modes under varied plasma conditions:insights from optical emission spectroscopy
Pengfei Qu;Guangdi Zhou;Peng Jin;Xu Han;Zhanguo Wang
Laboratory of Solid-State Optoelectronic Information Technology,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,ChinaLaboratory of Solid-State Optoelectronic Information Technology,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,ChinaLaboratory of Solid-State Optoelectronic Information Technology,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China||Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,ChinaLaboratory of Solid-State Optoelectronic Information Technology,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,ChinaLaboratory of Solid-State Optoelectronic Information Technology,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China||Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China
heteroepitaxydiamond filmsgrowth modesMPCVDOES
heteroepitaxydiamond filmsgrowth modesMPCVDOES
《半导体学报（英文版）》 2026 (1)
90-97,8
This research was funded by the National Key Res-earch and Development Program of China(Grant No.2022YFB3608602),the National Natural Science Foundation of China(Grant Nos.62404215 and 62574199)and Instru-ment and Equipment Development Project of CAS(Grant No.PTYQ2024TD0003).
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