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Influencing factors of noise characteristics in EBCMOS with uniformly doped P-type substratesOA

Influencing factors of noise characteristics in EBCMOS with uniformly doped P-type substrates

Xinyue He;Gangcheng Jiao;Hongchang Cheng;Tianjiao Lu;Ye Li;De Song;Weijun Chen

School of Science,Changchun University of Science and Technology,Changchun 130022,ChinaScience and Technology on Low-Light-Level Night Vision Laboratory,Xi'an 710065,ChinaScience and Technology on Low-Light-Level Night Vision Laboratory,Xi'an 710065,ChinaSchool of Science,Changchun University of Science and Technology,Changchun 130022,ChinaSchool of Science,Changchun University of Science and Technology,Changchun 130022,ChinaSchool of Science,Changchun University of Science and Technology,Changchun 130022,ChinaSchool of Science,Changchun University of Science and Technology,Changchun 130022,China

EBCMOSdark current electron numbergainSNR

EBCMOSdark current electron numbergainSNR

《半导体学报(英文版)》 2026 (1)

29-40,12

10.1088/1674-4926/25030039

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