Influencing factors of noise characteristics in EBCMOS with uniformly doped P-type substratesOA
Influencing factors of noise characteristics in EBCMOS with uniformly doped P-type substrates
Xinyue He;Gangcheng Jiao;Hongchang Cheng;Tianjiao Lu;Ye Li;De Song;Weijun Chen
School of Science,Changchun University of Science and Technology,Changchun 130022,ChinaScience and Technology on Low-Light-Level Night Vision Laboratory,Xi'an 710065,ChinaScience and Technology on Low-Light-Level Night Vision Laboratory,Xi'an 710065,ChinaSchool of Science,Changchun University of Science and Technology,Changchun 130022,ChinaSchool of Science,Changchun University of Science and Technology,Changchun 130022,ChinaSchool of Science,Changchun University of Science and Technology,Changchun 130022,ChinaSchool of Science,Changchun University of Science and Technology,Changchun 130022,China
EBCMOSdark current electron numbergainSNR
EBCMOSdark current electron numbergainSNR
《半导体学报(英文版)》 2026 (1)
29-40,12
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