首页|期刊导航|Nano-Micro Letters|Tellurium-Terminated MXene Synthesis via One-Step Tellurium Etching

Tellurium-Terminated MXene Synthesis via One-Step Tellurium EtchingOA

中文摘要

With the rapid development of twodimensional MXene materials,numerous preparation strategies have been proposed to enhance synthesis efficiency,mitigate environmental impact,and enable scalability for large-scale production.The compound etching approach,which relies on cationic oxidation of the A element of MAX phase precursors while anions typically adsorb onto MXene surfaces as functional groups,remains the main prevalent strategy.By contrast,synthesis methodologies utilizing elemental etching agents have been rarely reported.Here,we report a new elemental tellurium(Te)-based etching strategy for the preparation of MXene materials with tunable surface chemistry.By selectively removing the A-site element in MAX phases using Te,our approach avoids the use of toxic fluoride reagents and achieves tellurium-terminated surface groups that significantly enhance sodium storage performance.Experimental results show that Te-etched MXene delivers substantially higher capacities(exceeding 50%improvement over conventionally etched MXene)with superior rate capability,retaining high capacity at large current densities and demonstrating over 90%capacity retention after 1000 cycles.This innovative synthetic strategy provides new insight into controllable MXene preparation and performance optimization,while the as-obtained materials hold promises for high-performance sodium-ion batteries and other energy storage systems.

Guoliang Ma;Zongbin Luo;Hui Shao;Yanbin Shen;Zifeng Lin;Patrice Simon

College of Materials Science and Engineering,Sichuan University,Chengdu 610065,People’s Republic of ChinaCollege of Materials Science and Engineering,Sichuan University,Chengdu 610065,People’s Republic of ChinaLab,CAS Center for Excellence in Nanoscience,Suzhou Institute of Nano-Tech and Nano-Bionics(SINANO),Chinese Academy of Sciences(CAS),Suzhou 215123,People’s Republic of ChinaLab,CAS Center for Excellence in Nanoscience,Suzhou Institute of Nano-Tech and Nano-Bionics(SINANO),Chinese Academy of Sciences(CAS),Suzhou 215123,People’s Republic of ChinaCollege of Materials Science and Engineering,Sichuan University,Chengdu 610065,People’s Republic of ChinaCIRIMAT,Universite de Toulouse,CNRS,Toulouse,France

通用工业技术

Te-terminated MXeneElemental tellurium etchingSodium-ion storageHigh-rate performance

《Nano-Micro Letters》 2026 (1)

P.738-749,12

supported by the National Natural Science Foundation of China(52472228,22309202)Natural Science Foundation of Sichuan Province(2023NSFSC1942)the Gusu Leading Talents Program(ZXL2023190)。

10.1007/s40820-025-01875-1

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